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Chemicals, plastics and rubber industries

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Acidic character of metal-loaded amorphous and crystalline silica-aluminas determined by XPS and adsorption calorimetry

Article Abstract:

The acid character of metal ion loaded zeolite and silica-alumina samples was pictured by means of the XPS technique which was combined with microcalorimetry. Co, Cu and Ni ions were loaded on ZSM-5 and SiO2-Al2O3 by three different procedures. These were impregnation, ion exchange and solid-state ion-exchange. High values of the 2 p3/2 XPS bands of the metal ions were presented by the samples prepared by ion exchange of the two matrixes.

Author: Auroux, Aline, Guimon, Claude, Gervasini, Antonella
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 1999
Metal ions, Acidity function

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Influence of the preparation method on the surface characteristics and activity of boron-nitride supported noble metal catalysts

Article Abstract:

Study is presented to show how variations in the preparation method of boron-nitride-supported noble metal catalysts may influence the surface characteristics of the active phase and consequently the potential applications as catalysts for oxidation reactions. The catalytic performances of these materials are tested in the total oxidation of methane in lean conditions.

Author: Auroux, Aline, Guimon, Claude, Gervasini, Antonella, Postole, Georgeta, Bonnetot, Bernard
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2006
All Other Basic Inorganic Chemical Manufacturing, Boron & Compounds, Industrial inorganic chemicals, not elsewhere classified, Electric properties, Chemical reactions, Boron compounds, Nitrides

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Surface-controlled gas-phase deposition and characterization of highly dispersed vanadia on silica

Article Abstract:

Vanadyl triisopropoxide precursor was verified to be an appropriate precursor for the synthesis of highly dispersed V2O5/SiO2 materials by the gas-phase atomic layer deposition (ALD) technique. The controlled and reproducible chemisorption-based growth of vanadia on silica occurred in a temperature range from 363 to 393 K.

Author: Auroux, Aline, Keranen, Jetta, Guimon, Claude, Iiskola, Eero, Niinisto, Lauri
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2003
Industrial sand, Silica & Silica Sand, Industrial Sand Mining, Structure, Vanadium compounds

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Subjects list: Research, Silica, Silicon dioxide
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