Surface chemistry in the atomic layer deposition of TiN films from TiCl4 and ammonia

Article Abstract:

X-ray photoelectron spectroscopy is used to characterize the surface chemistry of atomic layer depositions (ALD) of titanium nitride films using alternate doses of TiCl4 and NH3. In terms of the incorporation of contaminants in the grown films, it is found that chlorine is deposited in small quantities on the surface whereas oxygen is detected all throughout the grown films.

Titanium compounds, Chlorides, Atomic properties, Dichloropropane, Nitrides

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Raman frequency shifts for the rotatory lattice mode close to the melting point in ammonia solid I

Article Abstract:

Spectroscopic modification of the Pippard relation to ammonia solid I is applied by using Raman frequencies for the rotatory lattice (librational) mode in the system close to the melting point. The values of the slope dP(sub m)/dT that are extracted from the linear plots are compared with the experimental values.

Analysis, Usage, Raman spectroscopy, Transition temperature, Phase transition temperatures

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