Chemical alteration of poly(tetrafluoroethylene) TFE Teflon induced by exposure to electrons and inert-gas ions

Article Abstract:

The chemical alterations of poly(tetrafluoroethylene) (TFE Teflon) by ~1.0-keV electrons and 1.0-keV He and Ar ions are studied using X-ray photoelectron spectroscopy (XPS). On comparing the chemical alterations caused due to electrons and ions against those caused by hyperthermal (~5eV) atomic oxygen (AO) and vacuum ultraviolet (VUV) radiation, it is observed that the largest amount of damage is caused by AO followed by VUV, inert-gas ions, and then electrons.

Usage, Photoelectron spectroscopy

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Rare gases on noble-metal surfaces: An angle-resolved photoemission study with high-energy resolution

Article Abstract:

A systematic angle-resolved photoemission (ARUPS) study on prototypical adsorbate systems consisting of rare-gas monolayer (Ar,Kr,Xe) on noble-metal (111) surface (Cu,Ag,Au) is presented. The study concluded that there is an immediate correspondence between the surface-state binding energy and the nobleness of the rare-gas adsorbates, reflecting the short-range repulsive forces between adsorbate and substrate.

Analysis, Photoemission, Precious metals

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Chemical alteration of poly(tetrafluoroethylene) (TFE) Teflon induced by exposure to hyperthermal atomic oxygen

Article Abstract:

The erosion of poly(tetrafluoroethylene) TFE Teflon by hyperthermal atomic oxygen (AO) are exmanied using X-ray photoelecton spectroscopy (XPS). The F/C atom ratio is further reduced to a value of 0.90 after a 25 h exposure.

Plastics Material and Resin Manufacturing, Oxygen, Plastics materials and resins, Polytetrafluoroethylene, Chemical properties

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