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Chemicals, plastics and rubber industries

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Comparison of the electrical properties and chemical stability of crystalline silicon(111) surfaces alkylated using Grignard reagents or olefins with Lewis acid catalysts

Article Abstract:

Four methods such as Lewis acid-mediated reduction of a terminal alkene, anodixzation in diethyl ether containing 3.0 M CH(sub 3)MgI are used to fictionalize crystalline Si(111) surfaces with alkyl groups. The chemical properties of each surface are characterized as a function of time exposed to air using X-ray photoelectron spectroscopy and the electrical properties of the various surfaces are probed using time-resolved radio frequency photoconductivity decay methods.

Author: Lewis, Nathan S., Webb, Lauren J.
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2003
Chemical properties, Alkyl groups

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Microwave reflectance studies of photoelectrochemical kinetics at semiconductor electrodes. 2. hydrogen evolution a p-Si in ammonium fluoride solution

Article Abstract:

The microwave reflectance methods were used to study the kinetics of photogeneration of hydrogen on p-Si in acidic fluoride solutions. The surface charging as the result of slow kinetics was expected to lead to band edge even at low light intensities, and the existence of this effect was confirmed by transient photocapacitance measurements.

Author: Peter, Laurence M., Walker, Alison B., Duffy, Noel W., Ushiroda, Shin, Pennock, Stephen R., Cass, Michael J.
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2003
Microwaves

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Electrochemical and electrical behavior of (111)-oriented Si surfaces alkoxylated through oxidative activation of Si-H bonds

Article Abstract:

The reaction chemistry of H-terminated (111)-oriented Si surfaces in the presence of one-electron oxidants in alcohol solvents is explored. This mechanism for Si-H activation is supported by infrared spectroscopy, temperature-programmed desorption spectroscopy and by X-ray photoelectron spectroscopic studies.

Author: Lauermann, Iver, Lewis, Nathan S., Haber, Loel A., Michalak, David, Vaid,Thomas P.
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2000
Spectrum analysis, Spectroscopy, Electrochemistry

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Subjects list: Research, Electric properties, Chemistry, Physical and theoretical, Physical chemistry, Silicon, Hydrogen
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