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Chemicals, plastics and rubber industries

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Gas-phase transport during the spreading of MoO3 on Al2O3 support surfaces: Photoelectron spectromicroscopic study

Article Abstract:

A study of the effect of different heat treatments on the spreading of the MoO3 crystallites is presented by systematically varying the temperature, the total pressure, and the humidity of the oxygen atmosphere. The study concluded that a gas-phase transport mechanism is active for the spreading of MoO3 on a flat Al2O3 support under the chosen conditions.

Author: Knozinger, H., Gunther, S., Taglauer, E., Esch, F., Gregoratti, L., Barinov, A., Kiskinova, M.
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2004
Aluminum Oxide, Molybdenum oxides, Atomic properties

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Photoelectron spectromicroscopy of potassium redistribution in the O2 + H2 reaction on Rh(110)

Article Abstract:

The reversible condensation of potassium into large K + O coadsorption islands that occurs during the O2 + H2 reaction on Rh(110) surface predosed with potassium is investigated. Scanning photoelectron microscopy is used as a spatially resolving in situ method to follow the development of the condensation process through calibrated K and O profiles.

Author: Gunther, S., Gregoratti, L., Kiskinova, M., Marbach, H., Neubrand, T., Hoyer, R.
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2004
Primary nonferrous metals, not elsewhere classified, Primary Smelting and Refining of Nonferrous Metal (except Copper and Aluminum), Potassium & Sodium Compounds, Potassium & Compounds, Rhodium, Potassium compounds

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Initial oxidation of a Rh(110) surface using atomic or molecular oxygen and reduction of the surface oxide by hydrogen

Article Abstract:

Study on the formation conditions, morphology, and reactivity of thin oxide films, grown on a Rh(110) surface in the ambient of atomic or molecular oxygen, is carried out. It is seen that the growth of oxide film by exposure of a Rh(110) surface to molecular oxygen requires higher pressures and temperatures.

Author: Esch, F., Gregoratti, L., Barinov, A., Kiskinova, M., Dudin, P., Dri, C., Africh, C.
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2005
Semiconductors and related devices, Semiconductor and Related Device Manufacturing, Science & research, Thin Film Materials, Research, Oxidation-reduction reaction, Oxidation-reduction reactions, Thin films, Dielectric films, Oxides

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Subjects list: Usage, Photoelectron spectroscopy, Chemical properties
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