Nitrogen and argon adsorption and SEM characterization of C60 and C60/C70 fullerenes: comparison with graphite

Article Abstract:

Scanning electron microscopy and 77.4 K nitrogen and argon adsorption were used to investigate the pore and surface structure properties of C60 and C60/C70 fullerene powders. The C60 and C60/C70 fullerene powders were found to consist of nonporous particles. The nitrogen and argon affinity to the fullerenes was observed to be weaker that to the graphite in the major part of the monolayer, However, nitrogen adsorption on the fullerenes was macroscopically similar to that of graphite in the multilayer regime.

Adsorption, Surface chemistry, Porosity, Carbon allotropes, Graphite

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Structures and energetics of some potential intermediates in titanium nitride chemical vapor deposition: TiCl(sub m)(NH2)(sub n), TiCl(sub m)(NH2)(sub n)NH, and TiCl(sub m)(NH2)(sub n)N. An ab initio molecular orbital study

Article Abstract:

Research was conducted to examine the various potential intermediates in the chemical vapor deposition (CVD) production of TiN films by a variant of the G2 level of theory. The structures of 23 potential intermediates in titanium nitride CVD were optimized at the B2LYP/6-311G(d) level. The bond dissociation reactions were estimated to be endothermic but ligand exchange and elimination reactions were fairly low-energy steps.

Usage, Thin films, Titanium compounds, Chemical vapor deposition, Molecular orbitals

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