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Chemicals, plastics and rubber industries

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Study of the formation of mesoporous material SBA-15 by EPR spectroscopy

Article Abstract:

The investigation of the formation mechanism of SBA-15 is focused with emphasis on the PEO interactions with the silica and the initiation of the micropores. A partitioning of the L62-NO between the precursors of the mesopores and micropores of the SBA-15 structure takes place at the very early stage of the reaction, and a continuous depletion of water within the corona-core interface was observed.

Author: Goldfarb, Daniella, Ruthstein, Sharon, Frydman, Veronica, Kababya, Shifra, Landau, Miron
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2003
Electron paramagnetic resonance spectroscopy

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High-quality nitrogen-doped fluorinated silicon oxide films prepared by temperature-difference-based liquid-phase deposition

Article Abstract:

The properties of nitrogen-doped fluorinated silicon oxide (SiOF) films deposited on silicon is analyzed using hydrosilicofluoric acid and ammonium hydroxide aqua as sources by the temperature-difference-based liquid-phase deposition (TD-LPD) method. It is concluded that nitrogen-doped SiOF films by the TD-LPD method with NH4OH incorporation is suitable for intermetal dielectric application.

Author: Tamoto, Naoko, M.K. Lee, W.H. Shieh, C.M. Shih, K.W. Tung
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2003
Industrial Gas Manufacturing, Industrial gases, Nitrogen, Films (Materials)

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In-situ FTIR studies reactions at the silicon/liquid interface: wet chemical etching of ultrathin SiO2 on Si(100)

Article Abstract:

The temporal evolution of surface reactions in liquid environment is studied using an in-situ spectroscopic approach. Using SiO2 etching process in hydrofluoric acid, the nature of the interfacial S(sub 1)/SiO2 layer shows different etching chemistry than does stiochiometric SiO2.

Author: Chen, J.G., Queeney, K.T., Fukidome, H., Chaban, E.E., Chabal, Y.J.
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2001
Fourier transform infrared spectroscopy

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Subjects list: Research, Usage, Chemistry, Physical and theoretical, Physical chemistry, Silicon compounds, Chemical properties, Optical properties
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