3-D capability turns CD-SEM into metrology system

Article Abstract:

Applied Materials Inc of Santa Clara, CA, has introduced the first production-worthy CD-SEM system capable of three-dimensional stereoscopic imaging. Named VeraSEM 3-D, the image processing equipment provides CD measurements and a view of the slope and shape of features such as 1:14 high-aspect ratio contact holes and trenches. The system is also capable of imaging sidewall profiles of device features down to 0.1 micron.

Other Computer Peripheral Equipment Manufacturing, Image Processing Equip, Applied Materials Inc.

---

System provides non-invasive, in situ metrology

Article Abstract:

Cambridge Metrology, based in Watertown, MA, is developing a photoconductance decay method which provides fast and accurate measurements for surface chemistry control in wet and dry environments in equipment and semiconductor manufacturing. The development is being supervised by a group of engineers at Massachusetts Institute of Technology. The system is best in measuring minority carrier lifetime in silicon because it features a non-invasive, contactless technique.

Product development, Measuring & Control Instruments, Navigational, Measuring, Electromedical, and Control Instruments Manufacturing, Cambridge Metrology

---

Integrated metrology moves to real-time, better accuracy

Article Abstract:

Nanometrics of Sunnyvale, CA, is set to unveil at SEMICON Japan a new semiconductor film measurement system that can simultaneously measure thickness, refractive index, extinction coefficient and dielectric dopant concentration. NanoSpec 9000 features three reflectometry techniques: visible, 400-800 nm; FTIR, 2.5-25 micrometers; and DUV, 190-400 nm. By following the trend towards 'supertool' modular architecture, the product is able to make faster and more accurate measurements.

Instrument Manufacturing for Measuring and Testing Electricity and Electrical Signals, Semiconductor Test Equip, Semiconductor test equipment, Nanometrics Inc.

Similar abstracts:

• Abstracts: CD metrology separates shape from scale in pattern transfer. Metrology hits the road to integration
• Abstracts: Asymmetric cell structure, driving innovations help PDPs match CRTs. Matsushita PDPs offer high contrast, compare well with CRTs
• Abstracts: Room with a better view: improving ergonomics of dispatch boards
• Abstracts: Lens performs full-color optical switching. Reticle defect review faces new demands. Optical lithography: 100 nm and beyond

This website is not affiliated with document authors or copyright owners. This page is provided for informational purposes only. Unintentional errors are possible.