'Brain circulation' replacing 'brain drain' to U.S. as foreign-born scientists, engineers return home

Article Abstract:

There are indications that about half of foreign-born scientists and technologists who studied for advanced degrees in the US are returning to their home countries. In previous years, foreign-born scientists chose to stay in the US and embark on careers such as government scientists and industrial researchers. Some of the causes of this trend are the more stringent US immigration policies, difficulties in finding jobs that fit in with career choices and the perception that many US firms do not have a high regard for the leadership qualities of foreign-born technologists.

Analysis, Emigration and immigration, Scientists, Brain drain, Technologists

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Unusual energy dept.-industry partnership to build 21st century computer chip may be co-op model

Article Abstract:

The decision by the US Dept of Energy in the fall of 1997 to organize the development of extreme ultraviolet lithography (EUVL) technology into a cooperative endeavor is nearing fruition. In Dec 1998, International SEMATECH, a group composed of semiconductor makers all over the world, cited the technology as the one it is considering for application in the 21st century. EUVL is the result of a cooperative R&D agreement collaboration between three national laboratories and three computer chip makers.

Standards, Methods, CPUs (Central processing units), Microprocessors, Design and construction, United States. Department of Energy, Lithography (Printing), Computer engineering, Lithography

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