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Destruction of formaldehyde with dielectric barrier discharge plasmas

Article Abstract:

Dielectric barrier discharge (DBD) plasmas offer an effective method for destroying formaldehyde (HCHO) molecules from gas streams. Under this technique, electrons are released with energy enough to result in the creation of gas-phase radicals which cause HCHO to decompose and be oxidized, producing carbon dioxide, water and carbon monoxide in the process. The ability of the method to remove HCHO is determined by the voltage used, gas composition and gas residence time.

Author: Chang, Moo Been, Lee, Chin Ching
Publisher: American Chemical Society
Publication Name: Environmental Science & Technology
Subject: Science and technology
ISSN: 0013-936X
Year: 1995
Methods, Formaldehyde, Separation (Technology), Decomposition (Chemistry)

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Gas-phase removal of NO from gas streams via dielectric barrier discharges

Article Abstract:

The use of plasma generated by dielectric barrier discharges can remove nitric oxide (NO) from gas streams. The procedure tested at over 95% efficiency levels. NO is harmful to humans and plants. The contaminant also deposits acid which can degrade materials. Experiment results infer that dielectric discharges may be an alternative to the traditional postcombustion technology for NO removal.

Author: Rood, Mark J., Chang, Moo Been, Kushner, Mark J.
Publisher: American Chemical Society
Publication Name: Environmental Science & Technology
Subject: Science and technology
ISSN: 0013-936X
Year: 1992
Nitric oxide, Electric discharges through gases, Electric discharges

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An atmospheric-pressure plasma process for C2F6 removal

Article Abstract:

This study was used to examine the effective of C2F6 conversion by using dielectric barrier discharges with atmospheric-pressure plasma processing. The study is broken down into an introduction, a discussion of the experiment and a discussion of its results. Various tables and graphs accompany the article.

Author: Chang, Moo Been, Yu, Sheng Jen
Publisher: American Chemical Society
Publication Name: Environmental Science & Technology
Subject: Science and technology
ISSN: 0013-936X
Year: 2001
United States, Science & research, Research & Development, Scientific Research and Development Services, Research institutes, Chemical vapor deposition, Atmospheric pressure, Plasma etching

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Subjects list: Research, Usage, Dielectric separation
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