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Chemicals, plastics and rubber industries

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Dative and Di- sigma bond binding states of pyridine on Si (100) and their thermal stability

Article Abstract:

The attachment chemistry of pyridine on Si(100) was studied using thermal desorption spectroscopy (TDS), X-ray photoelectron spectroscopy (XPS), high resolution electron energy loss spectroscopy (HREELS) and DFT theoretical calculations. Experimental results and DFT calculations show that pyridine molecules interact with Si (100) through both Si: N dative bonding and the [4+2] - like cycloaddition between the N1 and C4 atoms of the pyridine molecules with a Si=Si dimer, forming pyridine like and 1, 4- dihydropyridine like adducts respectively.

Author: Feng Tao, Ming Hua Qiao, Zhong Hai Wang, Guo Qin Xu
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2003
Cyclic Crude and Intermediate Manufacturing, Pyridine, Usage, Spectrum analysis, Spectroscopy

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Binding mechanisms of methyacryclic acid and methyl methacrylate on Si(111)-7*7-effect of substitution groups

Article Abstract:

The interaction of methacryclic acid and methyl methacrylate with Si(111)-7*7 is investigated using high-resolution electron energy loss spectroscopy (HREELS) and X-ray photoelectron spectroscopy (XPS). The different reaction pathways of the two compounds on Si(111)-7*7 demonstrate that the substitution group play an important role in determining the reaction channels for multifunctional molecules, leading to the desired flexibility in the organic modification of silicon surfaces.

Author: Guo Qin Xu, Hai Gou Huang, Jing Yan Huang, Yue Sheng Ning, Yan Xia Shao, Ying Hui Cai, Hai Hua Tang, Qi Peng Liu, Alshahateet, Solhe F., Yue Ming Sun
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2005
All Other Basic Organic Chemical Manufacturing, Silicon & Inorganic Compounds, Acrylic Acid, Analysis, X-ray spectroscopy, Silicon compounds, Structure, Chemical properties

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Thermal chemistry of CH3 on Si/Cu(100); the role of Sn as a promoter

Article Abstract:

The effect of tin on the thermal chemistry of CH3 on Si/Cu(100) is investigated. The temperature programmed desorption (TPD) results showed that (CH3)3SiH was the dominant product desorbing from Si/Cu(100) after exposure to CH3 radical.

Author: Strongin, Daniel R., Xiang V. Zhang, Goncharova, L.V., Ermakov, A.V., Hinch, B.J.
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2004
Copper

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Subjects list: Thermal properties, Silicon
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