Deposition of nanostructured fluoropolymer films on silicon substrates via plasma polymerization of allylpentafluorobenzene

Article Abstract:

Nanoporous and highly hydrophobic fluoropolyme films composed of nanospheres are deposited on the oxide-covered and hydrogen-terminated Si(100) surfaces via plasma polymerization of allypentafluorobenzene (APFB). The chemical composition and structure, as well as the physical morphology of the plasma polymerized APFB (pp-APFB) films could not be controlled to a large extent by the glow discharge conditions.

Semiconductors and related devices, Semiconductor and Related Device Manufacturing, All Other Basic Inorganic Chemical Manufacturing, Thin Film Materials, Industrial inorganic chemicals, not elsewhere classified, Silicon, Thin films, Dielectric films

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Plasmachemical amine functionalization of porous polystyrene spheres: The importance of particle size

Article Abstract:

It is observed that allylamine plasma functionalization of porous polystyrene spheres is dependent on particle size. A combination of Fmoc derivatization and cross-sectional Raman microscopy shows that an outer layer of approximately 3-4 mum can be selectively functionalized to yield relatively high amine group loadings.

Polystyrene, Styrene Resins, Polystyrene Resins NEC, Amines

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Super-repellent composite fluoropolymer surfaces

Article Abstract:

Water repellency enhances due to deposition of low surface plasma polymer layers and expanded PTFF substrate. The Casse-Baxter relationship was found to be more appropriate.

Substrates

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