High-resolution 19F MAS NMR spectroscopy of fluorocarbon films from pulsed PECVD of hexafluoropropylene oxide

Article Abstract:

A study was conducted to characterize the high-resolution 19F MAS nuclear magnetic resonance spectroscopy of fluorocarbon films from the pulsed plasma-enhanced chemical vapor deposition of hexafluoropropylene oxide. The films were prepared on 100 mm diameter silicon substrates. The spectroscopy studies were carried out using a spectrometer tuned to 254.0 MHz for 19F detection. Results indicated a higher resolution beyond the intermediate environment that was correlated with the sensitivity of fluorine nuclei to electronic fields.

Usage, Nuclear magnetic resonance spectroscopy, Thin films, Oxides

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Thermal annealing of fluorocarbon films grown by hot filament chemical vapor deposition

Article Abstract:

The effect of postdeposition annealing on the stability, structure and morphology of fluorocarbon films grown from hot filament chemical vapor deposition (HFCVD) using hexafluoropropylene oxide (HFPO) precursor is examined. It is observed that extraneous hydroxyl (OH) and carbonyl/carboxyl (CO/COO) incorporation could limit the thermal stability of HFPO and HFCVD films.

Thermal properties, Chemical vapor deposition, Chemical vapour deposition

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Small angle neutron scattering study of demixing in micellar solutions containing CTAC and a partially fluorinated cationic surfactant

Article Abstract:

Demixing of fluorocarbon and hydrocarbon surfactants is studied by small angle neutron scattering in aqueous solution. Measurements are performed under varying experimental conditions.

Surface active agents, Surface Active Agent Manufacturing, Neutrons, Neutron scattering

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