Understanding the effects of surface chemistry on Q: Mechanical energy dissipation in alkyl-terminated ([C.sub.1]-[C.sub.18]) microchemical silicon resonators

Article Abstract:

Mechanical energy dissipation in a micromechanical silicon resonator is sensitive to submonolayer changes in surface chemistry. These resonators terminated by a single monolayer of methyl groups have higher quality factors which then lower the rates of mechanical energy dissipation than comparable resonators terminated with either long-chain alkyl monolayers or hydrogen monolayers.

Monomolecular films, Thermal properties, Energy dissipation

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Surface chemical control of mechanical energy losses in micromachined silicon structures

Article Abstract:

Mechanical energy dissipation in micromechanical silicon structures is sensitive to the chemical state of the surface is discussed. When a single monolayer of hydrogen atoms is replaced by 13 angstrom of silicon oxide, which corresponds to the oxidation of less than 2 silicon bilayers, mechanical energy dissipation increases significantly.

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Surface chemistry of aerosolized nanoparticles: Thermal oxidation of silicon

Article Abstract:

The kinetics of reaction between silicon nanoparticles and molecular oxygen are studied by tandem differential mobility analysis. These results are useful to semiconductor applications, which needs high quality thin film by thermal oxidation.

Semiconductors and related devices, Semiconductor and Related Device Manufacturing, Thin Film Materials, Thin films, Dielectric films, Nanoparticles

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