Statistical control of VLSI fabrication processes

Article Abstract:

A framework for an integrated computer-aided design/computer-aided manufacturing (CAD/CAM) system is developed that will ensure the profitable design, fabrication, control and diagnosis of very-large-scale integration (VLSI) integrated circuits (ICs). Fluctuations in VLSI IC fabrication processes are the primary cause of diminished yields and profits in the production of ever-more-complex VLSI ICs and manufacturing technologies. The new CMU-CAM (Carnegie Mellon Univ-CAM) framework is based on a formal, profit-oriented and unified statistical monitoring, analysis and process control approach to VLSI IC fabrication. The system specifically integrates design for manufacturability, process scheduling, wafer processing and monitoring, diagnosis and testing, and statistical process control. Implementation and numerical examples are discussed.

Noncommercial research organizations, Integrated circuit fabrication, Industrial research, Industrial productivity, Performance improvement (Computers), Research and Development, Productivity, CAD/CAM, Statistical Analysis, Performance Improvement, Integrated Approach, technical

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Modeling and simulation of VLSI digital systems

Article Abstract:

The design of multi-level simulation systems calls for detailed evaluation of the modeling assumptions of the various levels, and the correct interface definitions between them. While discrete models are commonly constructed, progress is limited in the development of a formal framework for their construction. Two efforts to provide such a framework are discussed: the work of Sakallah, Zeigler, and Heydemann. The basic tenets of discrete modeling are presented, along with common algorithms used in writing simulators. The characteristics of discrete models are used to define the logic, functional, and behavioral levels of simulation.

Design, Modeling, Data modeling software, Discrete Simulation, Digital Computers

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Analysis technology for VLSI fabrication

Article Abstract:

The field of VLSI device analysis is comprehensively discussed with focus upon physical and chemical properties of materials and processes. Additional attention is focused upon electrical property characterization. The fundamentals of analytical methods are examined, their relations are clarified and their implications are discussed relative to such techniques as process control and failure analysis. Illustrations are extensively employed throughout the discussion.

Specifications, Analysis

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