Scanning tunneling microscope-based replacement lithography on self-assembled monolayers. Investigation of the relationship between monolayer structure and replacement bias

Article Abstract:

The way in which the type of initial self-assembled monolayers (SAMs) on the surface influences the replacement lithography process is determined. Thus, it is concluded that the degree of the displacement at a given bias likely correlates with the relative ease of the desorption step and the bias of replacement correlates with the electrochemical, reductive desorption potential of the SAM.

Author: Gorman, Christopher B., Lewis, Matthew S.
Lithography (Circuit fabrication)

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Efficient electrooptic polymers for THz applications

Article Abstract:

A method for producing electrooptic (EO) polymer films with EO coefficients 40-50 pm/V at 785 nm, which are suitable for use as emitters and sensors of THz radiation, is presented. The properties of EO polymers that make them attractive for THz applications are highlighted.

Author: Sinyukov, Alexander M., Hayden, L. Michael
Polymers, Chemical properties

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Subjects list: Research, Electrochemistry
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