Area-selective formation of macropore array by anisotropic electrochemical etching on an n-Si(100) surface in aqueous HF solution

Article Abstract:

An attempt was made to fabricate a high-aspect-ratio macropore array at selected areas by modifying the Si anodization conditions, such as the hole generation region, supply rate, and diffusion length. The front- and backside surfaces of n-type Si(100) wafers were coated with a thin Si(sub 3)N(sub 4) layer, and the frontside layer was micro-patterned using photolithography and reactive ion etching to from an array of microscopic opening at selected areas.

Photolithography

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Electrochemically grown tin oxide thin films: in situ characterization of electronic properties and growth mechanism

Article Abstract:

The oxidation and reduction processes of both polycrystalline tin and Sn (100) single crystals are investigated in borate buffer solution of pH 7.5 using cyclic voltammetry and in-situ characterizations such as Raman scattering, potential modulated reflectance spectroscopy (PMRS), and electrochemical scanning tunneling microscopy (EC-STM).

Tin compounds, Reflectance spectroscopy, Electrochemical analysis

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Electrochemical characterization of the open circuit deposition of platinum on silicon from fluoride solutions

Article Abstract:

An electrochemical study of the open circuit deposition of platinum on silicon from fluoride solutions is presented. The results indicate that the coupling between the anodic and cathodic half cell reactions is wider than a simple charge balance through the substrate.

Fluorides, Chemical properties

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