Lithographic imaging techniques for the formation of nanoscopic features

Article Abstract:

The lithography of nanostructures in the sub-100 nm dimension and the associated imaging methods are described. Reasons are also offered on why further advances in lithographic imaging may not be useful at the sub-100 nm regime. A description of the qualities of alternative resist and imaging technologies being developed which has been named next-generation lithography is also presented. Research in the development of new exposure and resist technologies happen very quickly and it can be expected that the discipline will be radically different in early 21st century.

Methods, Semiconductor industry, Production management, Nanotechnology, Printed circuit boards, Photolithography, Circuit printing

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Conjugated polymer-based organic solar cells

Article Abstract:

Synthesis and development of new electron-accepting materials are investigated to increase the efficiency of solar cells. In one of the new technology the solar cell efficiency of 4% is reported by replacing the liquid electrolyte by an organic hole transporting medium.

Polymers, Electric properties, Solar cells, Solar batteries, Chemical properties

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