3-D SOI using epitaxial lateral overgrowth

Article Abstract:

Three-dimensional silicon-on-insulator (3D-SOI) technology involves the fabrication of semiconductor devices in alternating layers of silicon separated by an insulator. Researchers at Purdue University have developed 3-D SOI stack using epitaxial lateral overgrowth (ELO). Using the ELP method, the researchers were able to create device size SOI islands ranging from 150 nm X 150 nm to 20 um x 3000 um. The defect densities of the SOI are lower than those found in current bonded and SIMOX layers.

Semiconductor Devices

---

2X reduction imaging interferometric lithography

Article Abstract:

Imaging interferometric lithography (IIL) offers arbitrary pattern capabilities as well as high resolution, with 2X imaging demonstrating a 3X improvement in resolution as compared with that of traditional optical lithography. ILL allows for larger off-axis illumination angles for higher spatial frequencies, extending the resolution beyond the optical lithography limits. More research is being conducted to further improve the sub-wavelength resolutions of IIL.

Nonmanufacturing technology, Camera Sensor Semiconductors, Photodetectors

---

157 nm lithography moves forward

Article Abstract:

The most important breakthroughs reported during the First International Symposium on 157 nm Lithography were in the development of resists and pellicles. Two suppliers presented positive data identifying a feasible platform, the fundamental chemistry for 157 nm lithography. In the pellicle arena, a soft polymer membrane material looks promising. The reliability, in addition to the transmissivity, also looks positive.

Lithographic Printing, Commercial Lithographic Printing, Lithography (Printing)

Similar abstracts:

• Abstracts: Digital cameras for every niche, market. The camera focus. Digital and film click at PMA 2000
• Abstracts: Pursuing the perfect low-k dielectric. Striking a compromise between good and perfect silicon. Low-k dielectrics: will spin-on or CVD prevail?
• Abstracts: Edison & Tesla: the founding fathers of electricity. Companies. Innovative technologies transform the industry
• Abstracts: BST used to detect hydrogen. Atomic layer deposition targets thin films. 300 mm equipment software requirements defined

This website is not affiliated with document authors or copyright owners. This page is provided for informational purposes only. Unintentional errors are possible.