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Electronics and electrical industries

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Pursuing the perfect low-k dielectric

Article Abstract:

Industry analysts were surprised by the decision by Motorola Inc. and International Business Systems Corp. to use copper interconnects rather than low-k materials, which is believed to be more enabling than copper. Low-k dielectrics, which reduce cross-talk noise, decrease line-to-line capacitance and lessen power dissipation problems, were not used by IBM and Motorola because copper is anticipated to offer lower manufacturing costs. The companies were also worried about problems with integrating and achieving a new low-k in production devices.

Comment:

Has decided to use copper interconnects rather than low-k materials, which is believed to be more enabling than copper

Author: Peters, Laura
Publisher: Reed Business Information, Inc. (US)
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1998
Telephone Apparatus Manufacturing, Strategy & planning, Interconnect Equipment, International Business Machines Corp., Motorola Inc., Computer networking equipment, Article

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Low-k dielectrics: will spin-on or CVD prevail?

Article Abstract:

The usage of low-k dielectrics has been spurred with the declaration of IBM that it will use SiLK in its 13 micron process and that Texas Instruments would use Applied Materials' Black Diamond CVD process with copper. Other proponents of CVD include LSI Logic and Sony. Supporters of CVD techniques say they are able to reuse existing toolsets and are able to realize simpler integration due to the structure of CVD siloxanes which are similar to silicon dioxides.

Author: Peters, Laura
Publisher: Reed Business Information, Inc. (US)
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 2000
Product information, Electronic Capacitor Manufacturing, Dielectric Capacitors

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Striking a compromise between good and perfect silicon

Article Abstract:

Debates on the level of purity control needed to start silicon wafers continue to preoccupy the industry. For instance, different methods of producing ultra-high-quality silicon at reduced costs were presented during the Silicon Wafer symposium at SEMICON West. Robert Falster, silicon materials research director of Novara, Italy-based MEMC Electronic Materials, pushed for the simplification of materials selection processes during a recent SEMI symposium.

Author: Peters, Laura
Publisher: Reed Business Information, Inc. (US)
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1999
Semiconductor and Related Device Manufacturing, Manufacturing processes, Silicon Wafers, Semiconductor wafers

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