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Electronics and electrical industries

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BST used to detect hydrogen

Article Abstract:

Research conducted at the Nanyang Technological University in Singapore has revealed that thin ferroelectric films of barium-strontium-titanate (BST) could be useful for the detection of hydrogen gas. To detect hydrogen gas and study hydrogen-induced interfacial polarization potential, amorphous BST thin-film capacitive devices were made on a silicon substrate. Results demonstrated that the hydrogen-induced interfacial polarization potential is closely correlated with the microstructure of ferroelectric thin films.

Author: Singer, Peter (Judge)
Publisher: Reed Business Information, Inc. (US)
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 2000
Science & research, Semiconductor Parts

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300 mm equipment software requirements defined

Article Abstract:

International SEMATECH and Selete, two semiconductor manufacturing technology consortia, have announced the creation of a joint effort to support the implementation of industry standard software functionality in 300 mm equipment. The collaboration is aimed at providing guidance to equipment suppliers on the interpretation and application of those standards. The joint effort will decrease variation in requirements and encourage consistent implementation among all equipment maker.

Author: Singer, Peter (Judge)
Publisher: Reed Business Information, Inc. (US)
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 2000
Product standards, safety, & recalls

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Atomic layer deposition targets thin films

Article Abstract:

Atomic layer deposition (ALD) is a promising new technique for depositing very thin films. Also called atomic layer chemical vapor deposition, the method can be used for a number of applications, including DRAM capacitor dielectrics, gate dielectrics and diffusion barriers. In contrast with traditional chemical vapor deposition techniques, ALD can be performed at lower temperatures and employ a wide range of precursors.

Author: Singer, Peter (Judge)
Publisher: Reed Business Information, Inc. (US)
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1999
Manufacturing processes

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