Nanostructure patterning
Article Abstract:
The Naval Research Laboratory's (NRL) research in the lithography, patterning and fabrication of structures of nanometer scale dimensions is described. Low energy e-beam lithography utilizes the spatially confined e-beam in a scanning tunneling microscope type probe. An approach for implementing dose correction for proximity effects in e-beam lithography is presented. Compositional disordering of GaAs/Ga(subscript x)Al(subscript 1-x)As heterostructures is utilized as a technique for pattern replication. Aluminum enhanced through the introduction of silicon into the heterostructure and gallium interdiffusion can be used for patterning.
Publication Name: Proceedings of the IEEE
Subject: Electronics
ISSN: 0018-9219
Year: 1991
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Semiconductor science: the fourth generation
Article Abstract:
Semiconductor science may be entering the final phase of its cyclical history. The third generation, which yielded man-made quantum systems and low-dimensional systems, appears to be coming to an end. Current work on low-dimensional systems is discussed as part of this progression, showing a clear connection between first-generation research and the creation of new semiconductor structures, novel band structures and associated fundamental excitations. Current directions in semiconductor research and possible applications of semiconductor physics in the fourth generation are discussed.
Publication Name: Proceedings of the IEEE
Subject: Electronics
ISSN: 0018-9219
Year: 1991
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