Effects of acceptor doping to KTaO3 on photocatalytic decomposition of pure H2O
Article Abstract:
Research was conducted to examine the decomposition of water and, more specifically, the influence of aliovalent cation substituted crystal lattice using a Ta-based perovskite oxide. The preparation of doped Ta-based perovskite oxide was performed by the calcination of a mixture of alkaline carbonate, a commercial metal oxide and Ta2O3 as a dopant at 1173 K in air. Results revealed that NiO supported on doped KTaO3 displays higher activity to the photocatalytic decomposition of H2O than that of a well-known photocatalyst of Pt/TiO2.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 1999
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Ab initio study of the photochemical decomposition mechanism of sulfonium compounds, a photoacid generator
Article Abstract:
Ab initio molecular orbital calculations were performed on the photochemical decomposition mechanism of sulfonium compounds. The results showed that the homolytic bond cleavage occurred in the lowest triplet state T1 and the singlet state S1 at the initial phase of the reaction. The final products from S1 were generated from the heterolytic bond cleavage. In the ground state S0, heterolytic bond cleavage has been found to occur at the initial phase, and the final products were from the homolytic cleavage.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 1998
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Thermal decomposition and isomerization processes of alkyl radicals
Article Abstract:
A shock-tube apparatus coupled with atomic resonance absorption spectrometry was used to investigate the thermal decomposition and isomerization processes of C3-C4 alkyl radicals, 1-C5H11, and 1-C6H13. In all alkyl radicals in the investigated temperature range (900-1400 K), energetically favored C-C bond cleavage was found to dominate over the C-H bond cleavage. The 1,2 or 1,3 isomerization reaction was found to be minor in C3 and C4 alkyl radicals.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 1999
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