Role of surface chemistry in semiconductor thin film processing

Article Abstract:

The surface chemical issues of the processing of column 13 and 15 semiconductors and silicon-based semiconductors are discussed. The roles of oxynitrides, TiN, and Cu as gate dielectrics, barrier layer, and interconnect material, respectively, are discussed. Control over the stoichiometry and alloy composition of compound semiconductors can lead to bandgap-engineered materials. Introduction of a nonequilibrium alloy concentration of carbon, which is kinetically stabilized, can enhance bandgap engineering.

Semiconductor films, Semiconductor preparation

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Modern surface science and surface technologies: an introduction

Article Abstract:

Contemporary trends in the scientific study of surface chemistry and its influence on technological innovations are described. Modern instrumentation in surface chemistry includes model catalyst systems, microelectronic devices, and microscopies. Surface microstructure and lattice parameters are areas of interest, especially when these are associated with reconstruction and adsorption properties of surfaces. The application of catalysis in various areas are discussed.

Innovations, Semiconductors, Catalysis

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