Photocatalytic decomposition of alcylsiloxane self-assembled monolayers on titanium oxide surfaces

Article Abstract:

The atomic force microscopy (AFM) is used to study the photocatalytic decomposition of octadecyltrichlorosilane (OTS) based self-assembled monolayer formed on TiO2. The reactive oxidizing species attack the alkyl radicals on the TiO2 surface producing alkoxy radicals and carbonyls.

Usage, Titanium compounds, Atomic force microscopy, Chemical properties

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Reduction of incubation period by employing OH-terminated Si(001) substrates in the atomic layer deposition of Al2O3

Article Abstract:

The phenomenon of low initial growth rates in atomic layer deposition (ALD) of various oxides on HF-treated substrates can be effectively avoided by use of OH-terminated SI(001) substrates. The effect of reducing the incubation period is confirmed in the ALD process of aluminum oxide thin films in which trimethylaluminum and water are used as sources of aluminum and oxygen.

All Other Basic Organic Chemical Manufacturing, All Other Basic Inorganic Chemical Manufacturing, Industrial Organic Chemicals, Industrial inorganic chemicals, not elsewhere classified, Aluminum Oxide, Silanes, Atomic properties, Silane

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